55 research outputs found

    Cylindrical Invisibility Cloak with Simplified Material Parameters is Inherently Visible

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    It was proposed that perfect invisibility cloaks can be constructed for hiding objects from electromagnetic illumination (Pendry et al., Science 312, p. 1780). The cylindrical cloaks experimentally demonstrated (Schurig et al., Science 314, p. 997) and proposed (Cai et al., Nat. Photon. 1, p. 224) have however simplified material parameters in order to facilitate easier realization as well as to avoid infinities in optical constants. Here we show that the cylindrical cloaks with simplified material parameters inherently allow the zeroth-order cylindrical wave to pass through the cloak as if the cloak is made of a homogeneous isotropic medium, and thus visible. To all high-order cylindrical waves, our numerical simulation suggests that the simplified cloak inherits some properties of the ideal cloak, but finite scatterings exist.Comment: 10 pages, 3 figure

    Topologically protected generation of spatiotemporal optical vortices with nonlocal spatial-mirror-symmetry-breaking metasurface

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    Recently nonlocal spatial-mirror-symmetry-breaking metasurfaces have been proposed to generate spatiotemporal optical vortices (STOVs), which carry transverse orbital angular momenta. Here we investigate the topological property of the STOV generator and show that spatial mirror symmetry breaking introduces a synthetic parameter dimension associated with the metasurface geometry. Furthermore, we demonstrate that there are well-defined vortices emerging with the synthetic parameter dimension, which can topologically protect the STOV generation robustly against structural perturbations and disorders. Since the vortices are always `created' or `annihilated' together in pairs of opposite charges in the kx ⁣ ⁣ω{{k}_{x}}\!-\!\omega domain, the total topological charge of these vortices is a conserved quantity. Our studies not only provide a new topological perspective for STOV generation but also lay a solid foundation for potential applications of STOV metasurfaces integrated with other optoelectronic devices, because of their robust immunity to fabrication defects
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